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O-Ring

O-Ring Application

O-Ring is one of products we are selling. We import them from Japan and supplier name is CS Chemical Corp. We bring customers high quality O-Ring used in many fields including semiconductor and optoelectronics industries.

Our O-Ring includes Viton & FFKM, we believe high quality products can bring customers to have high performance wafer process.

O-Ring advantages:

1. It is a new special material, with greater durability, resistance to high temperature and anti-acid ability.

2. Materials do not contain heavy metals and releasing agent to avoid contamination of wafer process.
3. Manufacturing process is in a clean room to keep having the clean performance of O-Ring.

:: Product types ::

Item	Attributes	Color	Hardness (Shore A)	Temperature
P-S75B	1. High performance resistance to chemicals, solvents, vapor, Plasma features etc.. 2. Low gas release, low gas permeability. 3. Low dissolution rate. 4. Application: Stripper, CMP, Coater, Developer, Cleaning, Dry etch, CVD, vacuum pipe, vacuum pump, chemical tank and chemical industry related equipment etc..	Black	75	260℃
P-S75BF	1. With resistance to chemicals and economy features etc.. 2. Resistance to solvents, amines, vapor features etc.. 3. Low dissolution rate. 4. Application: Stripper, CMP, Coater, Developer, Cleaning, Dry etch, CVD, vacuum pipe, vacuum pump, chemical tank and chemical industry related equipment etc..	Black	76	200℃
P-H75B2	1. Resistance to high temperature, amines, vapor features etc.. 2. Resistance to chemicals, Plasma, vapor features etc.. 3. Low gas release, low gas permeability. 4. Application: Diffusion, CVD, Anneal.	Black	74	320℃
P-S75W	1. With resistance to Plasma and economy features etc.. 2. Low gas release, low gas permeability. 3. Application: Dry etch, CVD.	White	76	230℃
P-H70NF2	1. Resistance to chemicals, amines, vapor, solvents features etc.. 2. Low gas release, low gas permeability. 3. Application: Dry etch, CVD.	Light yellow	65	200℃
P-H70PLUS	1. Resistance to chemicals, amines, solvents features etc.. 2. Low gas release, low gas permeability. 3. Application: Dry etch, CVD, high-purity liquid container / pipeline, cleaning station.	Light yellow	67	230℃
P-H75WU	1. Include resistance to Plasma, high temperature, and mechanical conditions. 2. Resistance to chemicals, amines, solvents features etc.. 3. Low gas release, low gas permeability. 4. Application: Dry etch, CVD	White	80	260℃ - 290℃